Application of molecular dynamics for low-energy ion implantation in crystalline silicon

10.1116/1.2137333

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Bibliographic Details
Main Authors:	Chan, H.Y., Srinivasan, M.P., Montgomery, N.J., Mulcahy, C.P.A., Biswas, S., Gossmann, H.-J.L., Harris, M., Nordlund, K., Benistant, F., Ng, C.M., Gui, D., Chan, L.
Other Authors:	CHEMICAL & BIOMOLECULAR ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/63500
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-63500
record_format	dspace
spelling	sg-nus-scholar.10635-635002023-10-30T21:22:50Z Application of molecular dynamics for low-energy ion implantation in crystalline silicon Chan, H.Y. Srinivasan, M.P. Montgomery, N.J. Mulcahy, C.P.A. Biswas, S. Gossmann, H.-J.L. Harris, M. Nordlund, K. Benistant, F. Ng, C.M. Gui, D. Chan, L. CHEMICAL & BIOMOLECULAR ENGINEERING 10.1116/1.2137333 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 24 1 462-467 JVTBD 2014-06-17T07:36:12Z 2014-06-17T07:36:12Z 2006-01 Article Chan, H.Y., Srinivasan, M.P., Montgomery, N.J., Mulcahy, C.P.A., Biswas, S., Gossmann, H.-J.L., Harris, M., Nordlund, K., Benistant, F., Ng, C.M., Gui, D., Chan, L. (2006-01). Application of molecular dynamics for low-energy ion implantation in crystalline silicon. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 24 (1) : 462-467. ScholarBank@NUS Repository. https://doi.org/10.1116/1.2137333 10711023 http://scholarbank.nus.edu.sg/handle/10635/63500 000235845900086 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1116/1.2137333
author2	CHEMICAL & BIOMOLECULAR ENGINEERING
author_facet	CHEMICAL & BIOMOLECULAR ENGINEERING Chan, H.Y. Srinivasan, M.P. Montgomery, N.J. Mulcahy, C.P.A. Biswas, S. Gossmann, H.-J.L. Harris, M. Nordlund, K. Benistant, F. Ng, C.M. Gui, D. Chan, L.
format	Article
author	Chan, H.Y. Srinivasan, M.P. Montgomery, N.J. Mulcahy, C.P.A. Biswas, S. Gossmann, H.-J.L. Harris, M. Nordlund, K. Benistant, F. Ng, C.M. Gui, D. Chan, L.
spellingShingle	Chan, H.Y. Srinivasan, M.P. Montgomery, N.J. Mulcahy, C.P.A. Biswas, S. Gossmann, H.-J.L. Harris, M. Nordlund, K. Benistant, F. Ng, C.M. Gui, D. Chan, L. Application of molecular dynamics for low-energy ion implantation in crystalline silicon
author_sort	Chan, H.Y.
title	Application of molecular dynamics for low-energy ion implantation in crystalline silicon
title_short	Application of molecular dynamics for low-energy ion implantation in crystalline silicon
title_full	Application of molecular dynamics for low-energy ion implantation in crystalline silicon
title_fullStr	Application of molecular dynamics for low-energy ion implantation in crystalline silicon
title_full_unstemmed	Application of molecular dynamics for low-energy ion implantation in crystalline silicon
title_sort	application of molecular dynamics for low-energy ion implantation in crystalline silicon
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/63500
_version_	1781782259368460288

Application of molecular dynamics for low-energy ion implantation in crystalline silicon

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