Via resistance reduction using "cool" PVD-Ta processing

Via resistance reduction using "cool" PVD-Ta processing

10.1149/1.1621417

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書目詳細資料
Main Authors:	Seet, C.S., Zhang, B.C., Yong, C., Liew, S.L., Li, K., Hsia, L.C., Seng, H.L., Osiposwicz, T., Sudijono, J., Zeng, H.C., Tan, J.B.
其他作者:	CHEMICAL & ENVIRONMENTAL ENGINEERING
格式:	Article
出版:	2014
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/66899
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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