Characteristics of NBTI in pMOSFETs with thermally and plasma nitrided gate oxides

10.1109/ICSICT.2008.4734614

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Bibliographic Details
Main Authors:	Liu, W.J., Liu, Z.Y., Luo, Y., Jiao, G.F., Huang, X.Y., Huang, D., Liao, C.C., Zhang, L.F., Gan, Z.H., Wong, W., Li, M.-F.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/69581
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-69581
record_format	dspace
spelling	sg-nus-scholar.10635-695812023-10-30T09:18:21Z Characteristics of NBTI in pMOSFETs with thermally and plasma nitrided gate oxides Liu, W.J. Liu, Z.Y. Luo, Y. Jiao, G.F. Huang, X.Y. Huang, D. Liao, C.C. Zhang, L.F. Gan, Z.H. Wong, W. Li, M.-F. ELECTRICAL & COMPUTER ENGINEERING 10.1109/ICSICT.2008.4734614 International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT 648-650 2014-06-19T03:02:18Z 2014-06-19T03:02:18Z 2008 Conference Paper Liu, W.J., Liu, Z.Y., Luo, Y., Jiao, G.F., Huang, X.Y., Huang, D., Liao, C.C., Zhang, L.F., Gan, Z.H., Wong, W., Li, M.-F. (2008). Characteristics of NBTI in pMOSFETs with thermally and plasma nitrided gate oxides. International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT : 648-650. ScholarBank@NUS Repository. https://doi.org/10.1109/ICSICT.2008.4734614 9781424421855 http://scholarbank.nus.edu.sg/handle/10635/69581 000265971001006 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1109/ICSICT.2008.4734614
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Liu, W.J. Liu, Z.Y. Luo, Y. Jiao, G.F. Huang, X.Y. Huang, D. Liao, C.C. Zhang, L.F. Gan, Z.H. Wong, W. Li, M.-F.
format	Conference or Workshop Item
author	Liu, W.J. Liu, Z.Y. Luo, Y. Jiao, G.F. Huang, X.Y. Huang, D. Liao, C.C. Zhang, L.F. Gan, Z.H. Wong, W. Li, M.-F.
spellingShingle	Liu, W.J. Liu, Z.Y. Luo, Y. Jiao, G.F. Huang, X.Y. Huang, D. Liao, C.C. Zhang, L.F. Gan, Z.H. Wong, W. Li, M.-F. Characteristics of NBTI in pMOSFETs with thermally and plasma nitrided gate oxides
author_sort	Liu, W.J.
title	Characteristics of NBTI in pMOSFETs with thermally and plasma nitrided gate oxides
title_short	Characteristics of NBTI in pMOSFETs with thermally and plasma nitrided gate oxides
title_full	Characteristics of NBTI in pMOSFETs with thermally and plasma nitrided gate oxides
title_fullStr	Characteristics of NBTI in pMOSFETs with thermally and plasma nitrided gate oxides
title_full_unstemmed	Characteristics of NBTI in pMOSFETs with thermally and plasma nitrided gate oxides
title_sort	characteristics of nbti in pmosfets with thermally and plasma nitrided gate oxides
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/69581
_version_	1781783105738113024

Characteristics of NBTI in pMOSFETs with thermally and plasma nitrided gate oxides

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