Chemical analysis of etching residues in metal gate stack for CMOS process

Studies in Surface Science and Catalysis

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Main Authors:	Wan, S.H., Hui, H.N., Won, J.Y., Bliznetsov, V.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/69599
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-69599
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spelling	sg-nus-scholar.10635-695992015-01-28T14:36:54Z Chemical analysis of etching residues in metal gate stack for CMOS process Wan, S.H. Hui, H.N. Won, J.Y. Bliznetsov, V. ELECTRICAL & COMPUTER ENGINEERING Studies in Surface Science and Catalysis 159 365-368 SSCTD 2014-06-19T03:02:30Z 2014-06-19T03:02:30Z 2006 Conference Paper Wan, S.H.,Hui, H.N.,Won, J.Y.,Bliznetsov, V. (2006). Chemical analysis of etching residues in metal gate stack for CMOS process. Studies in Surface Science and Catalysis 159 : 365-368. ScholarBank@NUS Repository. 01672991 http://scholarbank.nus.edu.sg/handle/10635/69599 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Studies in Surface Science and Catalysis
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Wan, S.H. Hui, H.N. Won, J.Y. Bliznetsov, V.
format	Conference or Workshop Item
author	Wan, S.H. Hui, H.N. Won, J.Y. Bliznetsov, V.
spellingShingle	Wan, S.H. Hui, H.N. Won, J.Y. Bliznetsov, V. Chemical analysis of etching residues in metal gate stack for CMOS process
author_sort	Wan, S.H.
title	Chemical analysis of etching residues in metal gate stack for CMOS process
title_short	Chemical analysis of etching residues in metal gate stack for CMOS process
title_full	Chemical analysis of etching residues in metal gate stack for CMOS process
title_fullStr	Chemical analysis of etching residues in metal gate stack for CMOS process
title_full_unstemmed	Chemical analysis of etching residues in metal gate stack for CMOS process
title_sort	chemical analysis of etching residues in metal gate stack for cmos process
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/69599
_version_	1681087043254353920

Chemical analysis of etching residues in metal gate stack for CMOS process

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