Feedback control applied to improve convergence of performance-based optical proximity correction in advanced lithography

Feedback control applied to improve convergence of performance-based optical proximity correction in advanced lithography

Proceedings of the 12th IASTED International Conference on Control and Applications, CA 2010

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Bibliographic Details
Main Authors: Qu, Y., Tay, A., Lee, T.H.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Circuit performance
Optical proximity correction
PI controller
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70326
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Institution: National University of Singapore
Description
Summary:Proceedings of the 12th IASTED International Conference on Control and Applications, CA 2010

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