In situ trench etching and releasing technique of high aspect ratio beams using magnetically enhanced reactive ion etching
10.1116/1.1431961
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2014
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sg-nus-scholar.10635-705742023-10-27T07:18:43Z In situ trench etching and releasing technique of high aspect ratio beams using magnetically enhanced reactive ion etching Kok, K.W. Yoo, W.J. Sooriakumar, K. ELECTRICAL & COMPUTER ENGINEERING 10.1116/1.1431961 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 20 1 154-158 JVTBD 2014-06-19T03:13:41Z 2014-06-19T03:13:41Z 2002-01 Conference Paper Kok, K.W., Yoo, W.J., Sooriakumar, K. (2002-01). In situ trench etching and releasing technique of high aspect ratio beams using magnetically enhanced reactive ion etching. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 20 (1) : 154-158. ScholarBank@NUS Repository. https://doi.org/10.1116/1.1431961 10711023 http://scholarbank.nus.edu.sg/handle/10635/70574 000173985500027 Scopus |
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National University of Singapore |
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NUS Library |
| continent |
Asia |
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Singapore Singapore |
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NUS Library |
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ScholarBank@NUS |
| description |
10.1116/1.1431961 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Kok, K.W. Yoo, W.J. Sooriakumar, K. |
| format |
Conference or Workshop Item |
| author |
Kok, K.W. Yoo, W.J. Sooriakumar, K. |
| spellingShingle |
Kok, K.W. Yoo, W.J. Sooriakumar, K. In situ trench etching and releasing technique of high aspect ratio beams using magnetically enhanced reactive ion etching |
| author_sort |
Kok, K.W. |
| title |
In situ trench etching and releasing technique of high aspect ratio beams using magnetically enhanced reactive ion etching |
| title_short |
In situ trench etching and releasing technique of high aspect ratio beams using magnetically enhanced reactive ion etching |
| title_full |
In situ trench etching and releasing technique of high aspect ratio beams using magnetically enhanced reactive ion etching |
| title_fullStr |
In situ trench etching and releasing technique of high aspect ratio beams using magnetically enhanced reactive ion etching |
| title_full_unstemmed |
In situ trench etching and releasing technique of high aspect ratio beams using magnetically enhanced reactive ion etching |
| title_sort |
in situ trench etching and releasing technique of high aspect ratio beams using magnetically enhanced reactive ion etching |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/70574 |
| _version_ |
1781783168321323008 |