Investigation of etching properties of metal nitride/high-k gate stacks using inductively coupled plasma
10.1116/1.1927536
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| Main Authors: | , , , |
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| Other Authors: | |
| Format: | Conference or Workshop Item |
| Published: |
2014
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| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/70678 |
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| Institution: | National University of Singapore |
| Summary: | 10.1116/1.1927536 |
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