Investigation of etching properties of metal nitride/high-k gate stacks using inductively coupled plasma
10.1116/1.1927536
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Main Authors: | Hwang, W.S., Chen, J., Yoo, W.J., Bliznetsov, V. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/70678 |
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Institution: | National University of Singapore |
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