Real-time spatial control of photoresist development rate

Real-time spatial control of photoresist development rate

10.1117/12.711509

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Bibliographic Details
Main Authors: Tay, A., Ho, W.-K., Hu, N., Kiew, C.-M., Tsai, K.-Y.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Lithography
Photoresist development
Real-time control
Temperature control
Online Access:http://scholarbank.nus.edu.sg/handle/10635/71571
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Institution: National University of Singapore
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Summary:10.1117/12.711509

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