Real-time spatial control of photoresist development rate

10.1117/12.711509

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Bibliographic Details
Main Authors:	Tay, A., Ho, W.-K., Hu, N., Kiew, C.-M., Tsai, K.-Y.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Lithography Photoresist development Real-time control Temperature control
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/71571
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Institution:	National University of Singapore

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