Robust real-time thin film thickness estimation

10.1109/ASMC.2006.1638724

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Bibliographic Details
Main Authors:	Kiew, C.M., Tay, A., Ho, W.K., Lim, K.W., Lee, J.H.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Film thickness estimation Microlithography Optical spectrometry Photoresist development Semiconductor manufacturing
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/71688
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Institution:	National University of Singapore

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