Schottky barrier tuning at NiSi/Si interface using pre-silicide aluminum and sulfur co-implant

• Main Authors: Tong, Y., Koh, S.-M., Zhou, Q., Du, A.Y., Yeo, Y.-C.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/71717
• Institution: National University of Singapore

10.1109/ICSICT.2010.5667527