Schottky barrier tuning at NiSi/Si interface using pre-silicide aluminum and sulfur co-implant
10.1109/ICSICT.2010.5667527
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Main Authors: | Tong, Y., Koh, S.-M., Zhou, Q., Du, A.Y., Yeo, Y.-C. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/71717 |
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Institution: | National University of Singapore |
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