Schottky barrier tuning at NiSi/Si interface using pre-silicide aluminum and sulfur co-implant

10.1109/ICSICT.2010.5667527

Saved in:
Bibliographic Details
Main Authors: Tong, Y., Koh, S.-M., Zhou, Q., Du, A.Y., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/71717
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Similar Items