Sub-micron channeling contrast microscopy on reactive ion etched deep Si microstructures

Sub-micron channeling contrast microscopy on reactive ion etched deep Si microstructures

10.1016/S0168-583X(01)01255-1

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Bibliographic Details
Main Authors: Teo, E.J., Alkaisi, M., Bettiol, A.A., Osipowicz, T., Van Kan, J., Watt, F., Markwitz, A.
Other Authors: PHYSICS
Format: Conference or Workshop Item
Published: 2014
Subjects:
Channeling contrast microscopy
Composition
Crystal quality
Reactive ion etched
Topography
Online Access:http://scholarbank.nus.edu.sg/handle/10635/77492
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Institution: National University of Singapore
Description
Summary:10.1016/S0168-583X(01)01255-1

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