Sub-micron channeling contrast microscopy on reactive ion etched deep Si microstructures

Sub-micron channeling contrast microscopy on reactive ion etched deep Si microstructures

10.1016/S0168-583X(01)01255-1

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Bibliographic Details
Main Authors: Teo, E.J., Alkaisi, M., Bettiol, A.A., Osipowicz, T., Van Kan, J., Watt, F., Markwitz, A.
Other Authors: PHYSICS
Format: Conference or Workshop Item
Published: 2014
Subjects:
Channeling contrast microscopy
Composition
Crystal quality
Reactive ion etched
Topography
Online Access:http://scholarbank.nus.edu.sg/handle/10635/77492
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-774922023-10-30T21:53:42Z Sub-micron channeling contrast microscopy on reactive ion etched deep Si microstructures Teo, E.J. Alkaisi, M. Bettiol, A.A. Osipowicz, T. Van Kan, J. Watt, F. Markwitz, A. PHYSICS CHEMISTRY Channeling contrast microscopy Composition Crystal quality Reactive ion etched Topography 10.1016/S0168-583X(01)01255-1 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 190 1-4 339-344 NIMBE 2014-06-23T05:55:45Z 2014-06-23T05:55:45Z 2002-05 Conference Paper Teo, E.J., Alkaisi, M., Bettiol, A.A., Osipowicz, T., Van Kan, J., Watt, F., Markwitz, A. (2002-05). Sub-micron channeling contrast microscopy on reactive ion etched deep Si microstructures. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 190 (1-4) : 339-344. ScholarBank@NUS Repository. https://doi.org/10.1016/S0168-583X(01)01255-1 0168583X http://scholarbank.nus.edu.sg/handle/10635/77492 000176108800067 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Channeling contrast microscopy
Composition
Crystal quality
Reactive ion etched
Topography
spellingShingle Channeling contrast microscopy
Composition
Crystal quality
Reactive ion etched
Topography
Teo, E.J.
Alkaisi, M.
Bettiol, A.A.
Osipowicz, T.
Van Kan, J.
Watt, F.
Markwitz, A.
Sub-micron channeling contrast microscopy on reactive ion etched deep Si microstructures
description 10.1016/S0168-583X(01)01255-1
author2 PHYSICS
author_facet PHYSICS
Teo, E.J.
Alkaisi, M.
Bettiol, A.A.
Osipowicz, T.
Van Kan, J.
Watt, F.
Markwitz, A.
format Conference or Workshop Item
author Teo, E.J.
Alkaisi, M.
Bettiol, A.A.
Osipowicz, T.
Van Kan, J.
Watt, F.
Markwitz, A.
author_sort Teo, E.J.
title Sub-micron channeling contrast microscopy on reactive ion etched deep Si microstructures
title_short Sub-micron channeling contrast microscopy on reactive ion etched deep Si microstructures
title_full Sub-micron channeling contrast microscopy on reactive ion etched deep Si microstructures
title_fullStr Sub-micron channeling contrast microscopy on reactive ion etched deep Si microstructures
title_full_unstemmed Sub-micron channeling contrast microscopy on reactive ion etched deep Si microstructures
title_sort sub-micron channeling contrast microscopy on reactive ion etched deep si microstructures
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/77492
_version_ 1781783776816267264

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