Fast ICCD imaging of KrF excimer laser induced titanium plasma plumes for silicon metallization

Fast ICCD imaging of KrF excimer laser induced titanium plasma plumes for silicon metallization

Applied Surface Science

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書目詳細資料
Main Authors:	Hong, M.H., Lu, Y.F., Ho, T.M., Lu, L.W., Low, T.S.
其他作者:	ELECTRICAL ENGINEERING
格式:	Article
出版:	2014
主題:	ICCD imaging Plasma dynamics Pulsed laser deposition Titanium plasma
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/80414
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!
機構:	National University of Singapore

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