Impact of nitrogen implantation into polysilicon followed by drive-in process on gate oxide integrity

10.1149/1.1392625

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Main Authors:	Cho, B.J., Ko, L.H., Nga, Y.A., Chan, L.H.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/80563
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Institution:	National University of Singapore

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record_format	dspace
spelling	sg-nus-scholar.10635-805632023-10-26T21:12:54Z Impact of nitrogen implantation into polysilicon followed by drive-in process on gate oxide integrity Cho, B.J. Ko, L.H. Nga, Y.A. Chan, L.H. ELECTRICAL ENGINEERING 10.1149/1.1392625 Journal of the Electrochemical Society 146 11 4259-4262 JESOA 2014-10-07T02:58:54Z 2014-10-07T02:58:54Z 1999-11 Article Cho, B.J., Ko, L.H., Nga, Y.A., Chan, L.H. (1999-11). Impact of nitrogen implantation into polysilicon followed by drive-in process on gate oxide integrity. Journal of the Electrochemical Society 146 (11) : 4259-4262. ScholarBank@NUS Repository. https://doi.org/10.1149/1.1392625 00134651 http://scholarbank.nus.edu.sg/handle/10635/80563 000083551500052 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1149/1.1392625
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Cho, B.J. Ko, L.H. Nga, Y.A. Chan, L.H.
format	Article
author	Cho, B.J. Ko, L.H. Nga, Y.A. Chan, L.H.
spellingShingle	Cho, B.J. Ko, L.H. Nga, Y.A. Chan, L.H. Impact of nitrogen implantation into polysilicon followed by drive-in process on gate oxide integrity
author_sort	Cho, B.J.
title	Impact of nitrogen implantation into polysilicon followed by drive-in process on gate oxide integrity
title_short	Impact of nitrogen implantation into polysilicon followed by drive-in process on gate oxide integrity
title_full	Impact of nitrogen implantation into polysilicon followed by drive-in process on gate oxide integrity
title_fullStr	Impact of nitrogen implantation into polysilicon followed by drive-in process on gate oxide integrity
title_full_unstemmed	Impact of nitrogen implantation into polysilicon followed by drive-in process on gate oxide integrity
title_sort	impact of nitrogen implantation into polysilicon followed by drive-in process on gate oxide integrity
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/80563
_version_	1781783921252368384

Impact of nitrogen implantation into polysilicon followed by drive-in process on gate oxide integrity

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