Modeling of tunneling currents through HfO2 and (HfO2)x(Al2O3)1-x gate stacks

10.1109/LED.2002.807708

Saved in:

Bibliographic Details
Main Authors:	Hou, Y.T., Li, M.F., Yu, H.Y., Kwong, D.-L.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Subjects:	(HfO2)x(Al2O3 )1-x CMOS scaling HfO2 High-k gate dielectric stacks Tunneling current
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/80738
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

id	sg-nus-scholar.10635-80738
record_format	dspace
spelling	sg-nus-scholar.10635-807382023-10-26T21:22:15Z Modeling of tunneling currents through HfO2 and (HfO2)x(Al2O3)1-x gate stacks Hou, Y.T. Li, M.F. Yu, H.Y. Kwong, D.-L. ELECTRICAL ENGINEERING ELECTRICAL & COMPUTER ENGINEERING (HfO2)x(Al2O3 )1-x CMOS scaling HfO2 High-k gate dielectric stacks Tunneling current 10.1109/LED.2002.807708 IEEE Electron Device Letters 24 2 96-98 EDLED 2014-10-07T03:00:47Z 2014-10-07T03:00:47Z 2003-02 Article Hou, Y.T., Li, M.F., Yu, H.Y., Kwong, D.-L. (2003-02). Modeling of tunneling currents through HfO2 and (HfO2)x(Al2O3)1-x gate stacks. IEEE Electron Device Letters 24 (2) : 96-98. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2002.807708 07413106 http://scholarbank.nus.edu.sg/handle/10635/80738 000182516600015 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	(HfO2)x(Al2O3 )1-x CMOS scaling HfO2 High-k gate dielectric stacks Tunneling current
spellingShingle	(HfO2)x(Al2O3 )1-x CMOS scaling HfO2 High-k gate dielectric stacks Tunneling current Hou, Y.T. Li, M.F. Yu, H.Y. Kwong, D.-L. Modeling of tunneling currents through HfO2 and (HfO2)x(Al2O3)1-x gate stacks
description	10.1109/LED.2002.807708
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Hou, Y.T. Li, M.F. Yu, H.Y. Kwong, D.-L.
format	Article
author	Hou, Y.T. Li, M.F. Yu, H.Y. Kwong, D.-L.
author_sort	Hou, Y.T.
title	Modeling of tunneling currents through HfO2 and (HfO2)x(Al2O3)1-x gate stacks
title_short	Modeling of tunneling currents through HfO2 and (HfO2)x(Al2O3)1-x gate stacks
title_full	Modeling of tunneling currents through HfO2 and (HfO2)x(Al2O3)1-x gate stacks
title_fullStr	Modeling of tunneling currents through HfO2 and (HfO2)x(Al2O3)1-x gate stacks
title_full_unstemmed	Modeling of tunneling currents through HfO2 and (HfO2)x(Al2O3)1-x gate stacks
title_sort	modeling of tunneling currents through hfo2 and (hfo2)x(al2o3)1-x gate stacks
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/80738
_version_	1781783936897122304

Modeling of tunneling currents through HfO2 and (HfO2)x(Al2O3)1-x gate stacks

Similar Items