Structural characterization of rapid thermal oxidized Si1-x-yGexCy alloy films grown by rapid thermal chemical vapor deposition

Journal of Applied Physics

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Main Authors:	Choi, W.K., Chen, J.H., Bera, L.K., Feng, W., Pey, K.L., Mi, J., Yang, C.Y., Ramam, A., Chua, S.J., Pan, J.S., Wee, A.T.S., Liu, R.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/81224
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-812242015-01-16T20:53:50Z Structural characterization of rapid thermal oxidized Si1-x-yGexCy alloy films grown by rapid thermal chemical vapor deposition Choi, W.K. Chen, J.H. Bera, L.K. Feng, W. Pey, K.L. Mi, J. Yang, C.Y. Ramam, A. Chua, S.J. Pan, J.S. Wee, A.T.S. Liu, R. ELECTRICAL ENGINEERING INST OF MATERIALS RESEARCH & ENGINEERING INSTITUTE OF ENGINEERING SCIENCE PHYSICS Journal of Applied Physics 87 1 192-197 JAPIA 2014-10-07T03:05:59Z 2014-10-07T03:05:59Z 2000-01-01 Article Choi, W.K.,Chen, J.H.,Bera, L.K.,Feng, W.,Pey, K.L.,Mi, J.,Yang, C.Y.,Ramam, A.,Chua, S.J.,Pan, J.S.,Wee, A.T.S.,Liu, R. (2000-01-01). Structural characterization of rapid thermal oxidized Si1-x-yGexCy alloy films grown by rapid thermal chemical vapor deposition. Journal of Applied Physics 87 (1) : 192-197. ScholarBank@NUS Repository. 00218979 http://scholarbank.nus.edu.sg/handle/10635/81224 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Journal of Applied Physics
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Choi, W.K. Chen, J.H. Bera, L.K. Feng, W. Pey, K.L. Mi, J. Yang, C.Y. Ramam, A. Chua, S.J. Pan, J.S. Wee, A.T.S. Liu, R.
format	Article
author	Choi, W.K. Chen, J.H. Bera, L.K. Feng, W. Pey, K.L. Mi, J. Yang, C.Y. Ramam, A. Chua, S.J. Pan, J.S. Wee, A.T.S. Liu, R.
spellingShingle	Choi, W.K. Chen, J.H. Bera, L.K. Feng, W. Pey, K.L. Mi, J. Yang, C.Y. Ramam, A. Chua, S.J. Pan, J.S. Wee, A.T.S. Liu, R. Structural characterization of rapid thermal oxidized Si1-x-yGexCy alloy films grown by rapid thermal chemical vapor deposition
author_sort	Choi, W.K.
title	Structural characterization of rapid thermal oxidized Si1-x-yGexCy alloy films grown by rapid thermal chemical vapor deposition
title_short	Structural characterization of rapid thermal oxidized Si1-x-yGexCy alloy films grown by rapid thermal chemical vapor deposition
title_full	Structural characterization of rapid thermal oxidized Si1-x-yGexCy alloy films grown by rapid thermal chemical vapor deposition
title_fullStr	Structural characterization of rapid thermal oxidized Si1-x-yGexCy alloy films grown by rapid thermal chemical vapor deposition
title_full_unstemmed	Structural characterization of rapid thermal oxidized Si1-x-yGexCy alloy films grown by rapid thermal chemical vapor deposition
title_sort	structural characterization of rapid thermal oxidized si1-x-ygexcy alloy films grown by rapid thermal chemical vapor deposition
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/81224
_version_	1681089032365277184

Structural characterization of rapid thermal oxidized Si1-x-yGexCy alloy films grown by rapid thermal chemical vapor deposition

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