Structural characterization of rapid thermal oxidized Si1-x-yGexCy alloy films grown by rapid thermal chemical vapor deposition

Structural characterization of rapid thermal oxidized Si1-x-yGexCy alloy films grown by rapid thermal chemical vapor deposition

Journal of Applied Physics

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Bibliographic Details
Main Authors:	Choi, W.K., Chen, J.H., Bera, L.K., Feng, W., Pey, K.L., Mi, J., Yang, C.Y., Ramam, A., Chua, S.J., Pan, J.S., Wee, A.T.S., Liu, R.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/81224
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Institution:	National University of Singapore

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