Structural characterization of rapid thermal oxidized Si1-x-yGexCy alloy films grown by rapid thermal chemical vapor deposition

• Main Authors: Choi, W.K., Chen, J.H., Bera, L.K., Feng, W., Pey, K.L., Mi, J., Yang, C.Y., Ramam, A., Chua, S.J., Pan, J.S., Wee, A.T.S., Liu, R.
• Other Authors: ELECTRICAL ENGINEERING
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/81224
• Institution: National University of Singapore

Journal of Applied Physics