Study of rf-sputtered yttrium oxide films on silicon by capacitance measurements

Study of rf-sputtered yttrium oxide films on silicon by capacitance measurements

10.1063/1.359588

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Bibliographic Details
Main Authors: Ling, C.H., Bhaskaran, J., Choi, W.K., Ah, L.K.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/81230
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Institution: National University of Singapore
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Summary:10.1063/1.359588

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