Study of rf-sputtered yttrium oxide films on silicon by capacitance measurements
10.1063/1.359588
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sg-nus-scholar.10635-812302023-10-26T08:17:21Z Study of rf-sputtered yttrium oxide films on silicon by capacitance measurements Ling, C.H. Bhaskaran, J. Choi, W.K. Ah, L.K. ELECTRICAL ENGINEERING 10.1063/1.359588 Journal of Applied Physics 77 12 6350-6353 2014-10-07T03:06:03Z 2014-10-07T03:06:03Z 1995 Article Ling, C.H., Bhaskaran, J., Choi, W.K., Ah, L.K. (1995). Study of rf-sputtered yttrium oxide films on silicon by capacitance measurements. Journal of Applied Physics 77 (12) : 6350-6353. ScholarBank@NUS Repository. https://doi.org/10.1063/1.359588 00218979 http://scholarbank.nus.edu.sg/handle/10635/81230 A1995RD57200041 Scopus |
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Asia |
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Singapore Singapore |
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| description |
10.1063/1.359588 |
| author2 |
ELECTRICAL ENGINEERING |
| author_facet |
ELECTRICAL ENGINEERING Ling, C.H. Bhaskaran, J. Choi, W.K. Ah, L.K. |
| format |
Article |
| author |
Ling, C.H. Bhaskaran, J. Choi, W.K. Ah, L.K. |
| spellingShingle |
Ling, C.H. Bhaskaran, J. Choi, W.K. Ah, L.K. Study of rf-sputtered yttrium oxide films on silicon by capacitance measurements |
| author_sort |
Ling, C.H. |
| title |
Study of rf-sputtered yttrium oxide films on silicon by capacitance measurements |
| title_short |
Study of rf-sputtered yttrium oxide films on silicon by capacitance measurements |
| title_full |
Study of rf-sputtered yttrium oxide films on silicon by capacitance measurements |
| title_fullStr |
Study of rf-sputtered yttrium oxide films on silicon by capacitance measurements |
| title_full_unstemmed |
Study of rf-sputtered yttrium oxide films on silicon by capacitance measurements |
| title_sort |
study of rf-sputtered yttrium oxide films on silicon by capacitance measurements |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/81230 |
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1781783977802072064 |