Superiority of N2O plasma annealing over O2 plasma annealing for amorphous tantalum pentoxide (Ta2O5) films

Superiority of N2O plasma annealing over O2 plasma annealing for amorphous tantalum pentoxide (Ta2O5) films

Japanese Journal of Applied Physics, Part 2: Letters

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Bibliographic Details
Main Authors: Lau, Wai Shing, Perera, Merinnage Tamara Chandima, Babu, Premila, Ow, Aik Keong, Han, Taejoon, Sandler, Nathan P., Tung, Chih Hang, Sheng, Tan Tsu, Chu, Paul K.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/81232
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Institution: National University of Singapore
Description
Summary:Japanese Journal of Applied Physics, Part 2: Letters

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