Superiority of N2O plasma annealing over O2 plasma annealing for amorphous tantalum pentoxide (Ta2O5) films

Japanese Journal of Applied Physics, Part 2: Letters

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Bibliographic Details
Main Authors:	Lau, Wai Shing, Perera, Merinnage Tamara Chandima, Babu, Premila, Ow, Aik Keong, Han, Taejoon, Sandler, Nathan P., Tung, Chih Hang, Sheng, Tan Tsu, Chu, Paul K.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/81232
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-81232
record_format	dspace
spelling	sg-nus-scholar.10635-812322015-01-11T08:05:25Z Superiority of N2O plasma annealing over O2 plasma annealing for amorphous tantalum pentoxide (Ta2O5) films Lau, Wai Shing Perera, Merinnage Tamara Chandima Babu, Premila Ow, Aik Keong Han, Taejoon Sandler, Nathan P. Tung, Chih Hang Sheng, Tan Tsu Chu, Paul K. ELECTRICAL ENGINEERING INSTITUTE OF MICROELECTRONICS Japanese Journal of Applied Physics, Part 2: Letters 37 4 B L435-L437 JAPLD 2014-10-07T03:06:04Z 2014-10-07T03:06:04Z 1998 Article Lau, Wai Shing,Perera, Merinnage Tamara Chandima,Babu, Premila,Ow, Aik Keong,Han, Taejoon,Sandler, Nathan P.,Tung, Chih Hang,Sheng, Tan Tsu,Chu, Paul K. (1998). Superiority of N2O plasma annealing over O2 plasma annealing for amorphous tantalum pentoxide (Ta2O5) films. Japanese Journal of Applied Physics, Part 2: Letters 37 (4 B) : L435-L437. ScholarBank@NUS Repository. 00214922 http://scholarbank.nus.edu.sg/handle/10635/81232 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Japanese Journal of Applied Physics, Part 2: Letters
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Lau, Wai Shing Perera, Merinnage Tamara Chandima Babu, Premila Ow, Aik Keong Han, Taejoon Sandler, Nathan P. Tung, Chih Hang Sheng, Tan Tsu Chu, Paul K.
format	Article
author	Lau, Wai Shing Perera, Merinnage Tamara Chandima Babu, Premila Ow, Aik Keong Han, Taejoon Sandler, Nathan P. Tung, Chih Hang Sheng, Tan Tsu Chu, Paul K.
spellingShingle	Lau, Wai Shing Perera, Merinnage Tamara Chandima Babu, Premila Ow, Aik Keong Han, Taejoon Sandler, Nathan P. Tung, Chih Hang Sheng, Tan Tsu Chu, Paul K. Superiority of N2O plasma annealing over O2 plasma annealing for amorphous tantalum pentoxide (Ta2O5) films
author_sort	Lau, Wai Shing
title	Superiority of N2O plasma annealing over O2 plasma annealing for amorphous tantalum pentoxide (Ta2O5) films
title_short	Superiority of N2O plasma annealing over O2 plasma annealing for amorphous tantalum pentoxide (Ta2O5) films
title_full	Superiority of N2O plasma annealing over O2 plasma annealing for amorphous tantalum pentoxide (Ta2O5) films
title_fullStr	Superiority of N2O plasma annealing over O2 plasma annealing for amorphous tantalum pentoxide (Ta2O5) films
title_full_unstemmed	Superiority of N2O plasma annealing over O2 plasma annealing for amorphous tantalum pentoxide (Ta2O5) films
title_sort	superiority of n2o plasma annealing over o2 plasma annealing for amorphous tantalum pentoxide (ta2o5) films
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/81232
_version_	1681089033832235008

Superiority of N2O plasma annealing over O2 plasma annealing for amorphous tantalum pentoxide (Ta2O5) films

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