Superiority of N2O plasma annealing over O2 plasma annealing for amorphous tantalum pentoxide (Ta2O5) films

• Main Authors: Lau, Wai Shing, Perera, Merinnage Tamara Chandima, Babu, Premila, Ow, Aik Keong, Han, Taejoon, Sandler, Nathan P., Tung, Chih Hang, Sheng, Tan Tsu, Chu, Paul K.
• 其他作者: INSTITUTE OF MICROELECTRONICS
• 格式: Article
• 出版: 2014
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/81232
• 機構: National University of Singapore

Japanese Journal of Applied Physics, Part 2: Letters