Trap generation in CVD SiO2 subjected to 253.7nm ultraviolet irradiation

Trap generation in CVD SiO2 subjected to 253.7nm ultraviolet irradiation

Electronics Letters

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Bibliographic Details
Main Authors: Ling, C.H., Cheng, Z.Y.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Subjects:
Carrier lifetime
Chemical vapour deposition
Electron traps
Minority carriers
Silicon dioxide
Online Access:http://scholarbank.nus.edu.sg/handle/10635/81305
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-813052015-01-09T14:24:43Z Trap generation in CVD SiO2 subjected to 253.7nm ultraviolet irradiation Ling, C.H. Cheng, Z.Y. ELECTRICAL ENGINEERING Carrier lifetime Chemical vapour deposition Electron traps Minority carriers Silicon dioxide Electronics Letters 33 1 104-105 ELLEA 2014-10-07T03:06:53Z 2014-10-07T03:06:53Z 1997-01-02 Article Ling, C.H.,Cheng, Z.Y. (1997-01-02). Trap generation in CVD SiO2 subjected to 253.7nm ultraviolet irradiation. Electronics Letters 33 (1) : 104-105. ScholarBank@NUS Repository. 00135194 http://scholarbank.nus.edu.sg/handle/10635/81305 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
topic Carrier lifetime
Chemical vapour deposition
Electron traps
Minority carriers
Silicon dioxide
spellingShingle Carrier lifetime
Chemical vapour deposition
Electron traps
Minority carriers
Silicon dioxide
Ling, C.H.
Cheng, Z.Y.
Trap generation in CVD SiO2 subjected to 253.7nm ultraviolet irradiation
description Electronics Letters
author2 ELECTRICAL ENGINEERING
author_facet ELECTRICAL ENGINEERING
Ling, C.H.
Cheng, Z.Y.
format Article
author Ling, C.H.
Cheng, Z.Y.
author_sort Ling, C.H.
title Trap generation in CVD SiO2 subjected to 253.7nm ultraviolet irradiation
title_short Trap generation in CVD SiO2 subjected to 253.7nm ultraviolet irradiation
title_full Trap generation in CVD SiO2 subjected to 253.7nm ultraviolet irradiation
title_fullStr Trap generation in CVD SiO2 subjected to 253.7nm ultraviolet irradiation
title_full_unstemmed Trap generation in CVD SiO2 subjected to 253.7nm ultraviolet irradiation
title_sort trap generation in cvd sio2 subjected to 253.7nm ultraviolet irradiation
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/81305
_version_ 1681089047063166976

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