Application of excimer laser annealing in the formation of ultra-shallow p+/n junctions

10.1117/12.405380

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Bibliographic Details
Main Authors:	Chong, Y.F., Pey, K.L., Wee, A.T.S., See, A., Tung, C.-H., Gopalakrishnan, R., Lu, Y.F.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Excimer laser annealing Rapid thermal annealing Ultra-low energy ion implantation Ultra-shallow junction
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/81379
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-81379
record_format	dspace
spelling	sg-nus-scholar.10635-813792023-10-29T23:07:20Z Application of excimer laser annealing in the formation of ultra-shallow p+/n junctions Chong, Y.F. Pey, K.L. Wee, A.T.S. See, A. Tung, C.-H. Gopalakrishnan, R. Lu, Y.F. ELECTRICAL ENGINEERING INSTITUTE OF MICROELECTRONICS PHYSICS Excimer laser annealing Rapid thermal annealing Ultra-low energy ion implantation Ultra-shallow junction 10.1117/12.405380 Proceedings of SPIE - The International Society for Optical Engineering 4227 124-132 PSISD 2014-10-07T03:07:41Z 2014-10-07T03:07:41Z 2000 Conference Paper Chong, Y.F., Pey, K.L., Wee, A.T.S., See, A., Tung, C.-H., Gopalakrishnan, R., Lu, Y.F. (2000). Application of excimer laser annealing in the formation of ultra-shallow p+/n junctions. Proceedings of SPIE - The International Society for Optical Engineering 4227 : 124-132. ScholarBank@NUS Repository. https://doi.org/10.1117/12.405380 0277786X http://scholarbank.nus.edu.sg/handle/10635/81379 000167995300021 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Excimer laser annealing Rapid thermal annealing Ultra-low energy ion implantation Ultra-shallow junction
spellingShingle	Excimer laser annealing Rapid thermal annealing Ultra-low energy ion implantation Ultra-shallow junction Chong, Y.F. Pey, K.L. Wee, A.T.S. See, A. Tung, C.-H. Gopalakrishnan, R. Lu, Y.F. Application of excimer laser annealing in the formation of ultra-shallow p+/n junctions
description	10.1117/12.405380
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Chong, Y.F. Pey, K.L. Wee, A.T.S. See, A. Tung, C.-H. Gopalakrishnan, R. Lu, Y.F.
format	Conference or Workshop Item
author	Chong, Y.F. Pey, K.L. Wee, A.T.S. See, A. Tung, C.-H. Gopalakrishnan, R. Lu, Y.F.
author_sort	Chong, Y.F.
title	Application of excimer laser annealing in the formation of ultra-shallow p+/n junctions
title_short	Application of excimer laser annealing in the formation of ultra-shallow p+/n junctions
title_full	Application of excimer laser annealing in the formation of ultra-shallow p+/n junctions
title_fullStr	Application of excimer laser annealing in the formation of ultra-shallow p+/n junctions
title_full_unstemmed	Application of excimer laser annealing in the formation of ultra-shallow p+/n junctions
title_sort	application of excimer laser annealing in the formation of ultra-shallow p+/n junctions
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/81379
_version_	1781783985275273216

Application of excimer laser annealing in the formation of ultra-shallow p+/n junctions

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