Breakdown of reoxidized nitrided oxide (ONO) in Flash memory devices upon current stressing
Proceedings of the IEEE Hong Kong Electron Devices Meeting
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sg-nus-scholar.10635-813842015-01-07T05:52:02Z Breakdown of reoxidized nitrided oxide (ONO) in Flash memory devices upon current stressing Cha, C.L. Chor, E.F. Gong, H. Zhang, A.Q. Chan, L. ELECTRICAL ENGINEERING MATERIALS SCIENCE Proceedings of the IEEE Hong Kong Electron Devices Meeting 82-85 252 2014-10-07T03:07:44Z 2014-10-07T03:07:44Z 1997 Conference Paper Cha, C.L.,Chor, E.F.,Gong, H.,Zhang, A.Q.,Chan, L. (1997). Breakdown of reoxidized nitrided oxide (ONO) in Flash memory devices upon current stressing. Proceedings of the IEEE Hong Kong Electron Devices Meeting : 82-85. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/81384 NOT_IN_WOS Scopus |
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Proceedings of the IEEE Hong Kong Electron Devices Meeting |
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ELECTRICAL ENGINEERING |
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ELECTRICAL ENGINEERING Cha, C.L. Chor, E.F. Gong, H. Zhang, A.Q. Chan, L. |
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Conference or Workshop Item |
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Cha, C.L. Chor, E.F. Gong, H. Zhang, A.Q. Chan, L. |
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Cha, C.L. Chor, E.F. Gong, H. Zhang, A.Q. Chan, L. Breakdown of reoxidized nitrided oxide (ONO) in Flash memory devices upon current stressing |
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Cha, C.L. |
title |
Breakdown of reoxidized nitrided oxide (ONO) in Flash memory devices upon current stressing |
title_short |
Breakdown of reoxidized nitrided oxide (ONO) in Flash memory devices upon current stressing |
title_full |
Breakdown of reoxidized nitrided oxide (ONO) in Flash memory devices upon current stressing |
title_fullStr |
Breakdown of reoxidized nitrided oxide (ONO) in Flash memory devices upon current stressing |
title_full_unstemmed |
Breakdown of reoxidized nitrided oxide (ONO) in Flash memory devices upon current stressing |
title_sort |
breakdown of reoxidized nitrided oxide (ono) in flash memory devices upon current stressing |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/81384 |
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1681089061427609600 |