New method for the localization of metallization defects using cathodoluminescence imaging

Proceedings of the International Symposium on the Physical & Failure Analysis of Integrated Circuits, IPFA

Saved in:

Bibliographic Details
Main Authors:	Liu, X., Phang, J.C.H., Chan, D.S.H., Chim, W.K.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/81592
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

Be the first to leave a comment!

Similar Items