Quantum tunneling and scalability of HfO2 and HfAlO gate stacks
Technical Digest - International Electron Devices Meeting
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2014
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sg-nus-scholar.10635-816942015-01-25T10:22:10Z Quantum tunneling and scalability of HfO2 and HfAlO gate stacks Hou, Y.T. Li, M.F. Yu, H.Y. Jin, Y. Kwong, D.-L. ELECTRICAL ENGINEERING ELECTRICAL & COMPUTER ENGINEERING Technical Digest - International Electron Devices Meeting 731-734 TDIMD 2014-10-07T03:11:01Z 2014-10-07T03:11:01Z 2002 Conference Paper Hou, Y.T.,Li, M.F.,Yu, H.Y.,Jin, Y.,Kwong, D.-L. (2002). Quantum tunneling and scalability of HfO2 and HfAlO gate stacks. Technical Digest - International Electron Devices Meeting : 731-734. ScholarBank@NUS Repository. 01631918 http://scholarbank.nus.edu.sg/handle/10635/81694 NOT_IN_WOS Scopus |
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Technical Digest - International Electron Devices Meeting |
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ELECTRICAL ENGINEERING |
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ELECTRICAL ENGINEERING Hou, Y.T. Li, M.F. Yu, H.Y. Jin, Y. Kwong, D.-L. |
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Hou, Y.T. Li, M.F. Yu, H.Y. Jin, Y. Kwong, D.-L. |
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Hou, Y.T. Li, M.F. Yu, H.Y. Jin, Y. Kwong, D.-L. Quantum tunneling and scalability of HfO2 and HfAlO gate stacks |
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Hou, Y.T. |
title |
Quantum tunneling and scalability of HfO2 and HfAlO gate stacks |
title_short |
Quantum tunneling and scalability of HfO2 and HfAlO gate stacks |
title_full |
Quantum tunneling and scalability of HfO2 and HfAlO gate stacks |
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Quantum tunneling and scalability of HfO2 and HfAlO gate stacks |
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Quantum tunneling and scalability of HfO2 and HfAlO gate stacks |
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quantum tunneling and scalability of hfo2 and hfalo gate stacks |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/81694 |
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