Study of implanted boron distribution in p+n structures using scanning capacitance microscopy

10.1117/12.405388

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Bibliographic Details
Main Authors: Teo, Y.L., Pey, K.L., Chim, W.K., Chong, Y.F.
Other Authors: ELECTRICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/81769
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Institution: National University of Singapore
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