Atomic layer deposited high-κ films and their role in metal-insulator-metal capacitors for Si RF/analog integrated circuit applications

Atomic layer deposited high-κ films and their role in metal-insulator-metal capacitors for Si RF/analog integrated circuit applications

10.1002/cvde.200506393

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Bibliographic Details
Main Authors: Zhu, C., Cho, B.-J., Li, M.-F.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
ALD
HfO2-Al2O3 laminate
High-k
MIM capacitor
Online Access:http://scholarbank.nus.edu.sg/handle/10635/81987
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Institution: National University of Singapore
Description
Summary:10.1002/cvde.200506393

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