Atomic layer deposited high-κ films and their role in metal-insulator-metal capacitors for Si RF/analog integrated circuit applications

10.1002/cvde.200506393

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Bibliographic Details
Main Authors:	Zhu, C., Cho, B.-J., Li, M.-F.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	ALD HfO2-Al2O3 laminate High-k MIM capacitor
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/81987
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-81987
record_format	dspace
spelling	sg-nus-scholar.10635-819872023-10-29T22:26:37Z Atomic layer deposited high-κ films and their role in metal-insulator-metal capacitors for Si RF/analog integrated circuit applications Zhu, C. Cho, B.-J. Li, M.-F. ELECTRICAL & COMPUTER ENGINEERING ALD HfO2-Al2O3 laminate High-k MIM capacitor 10.1002/cvde.200506393 Chemical Vapor Deposition 12 2-3 165-171 CVDEF 2014-10-07T04:24:02Z 2014-10-07T04:24:02Z 2006-03 Article Zhu, C., Cho, B.-J., Li, M.-F. (2006-03). Atomic layer deposited high-κ films and their role in metal-insulator-metal capacitors for Si RF/analog integrated circuit applications. Chemical Vapor Deposition 12 (2-3) : 165-171. ScholarBank@NUS Repository. https://doi.org/10.1002/cvde.200506393 09481907 http://scholarbank.nus.edu.sg/handle/10635/81987 000236489900011 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	ALD HfO2-Al2O3 laminate High-k MIM capacitor
spellingShingle	ALD HfO2-Al2O3 laminate High-k MIM capacitor Zhu, C. Cho, B.-J. Li, M.-F. Atomic layer deposited high-κ films and their role in metal-insulator-metal capacitors for Si RF/analog integrated circuit applications
description	10.1002/cvde.200506393
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Zhu, C. Cho, B.-J. Li, M.-F.
format	Article
author	Zhu, C. Cho, B.-J. Li, M.-F.
author_sort	Zhu, C.
title	Atomic layer deposited high-κ films and their role in metal-insulator-metal capacitors for Si RF/analog integrated circuit applications
title_short	Atomic layer deposited high-κ films and their role in metal-insulator-metal capacitors for Si RF/analog integrated circuit applications
title_full	Atomic layer deposited high-κ films and their role in metal-insulator-metal capacitors for Si RF/analog integrated circuit applications
title_fullStr	Atomic layer deposited high-κ films and their role in metal-insulator-metal capacitors for Si RF/analog integrated circuit applications
title_full_unstemmed	Atomic layer deposited high-κ films and their role in metal-insulator-metal capacitors for Si RF/analog integrated circuit applications
title_sort	atomic layer deposited high-κ films and their role in metal-insulator-metal capacitors for si rf/analog integrated circuit applications
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/81987
_version_	1781784032655179776

Atomic layer deposited high-κ films and their role in metal-insulator-metal capacitors for Si RF/analog integrated circuit applications

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