Effect of surface NH 3 anneal on the physical and electrical properties of HfO 2 films on Ge substrate

10.1063/1.1737057

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Bibliographic Details
Main Authors:	Wu, N., Zhang, Q., Zhu, C., Yeo, C.C., Whang, S.J., Chan, D.S.H., Li, M.F., Cho, B.J., Chin, A., Kwong, D.-L., Du, A.Y., Tung, C.H., Balasubramanian, N.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82213
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-82213
record_format	dspace
spelling	sg-nus-scholar.10635-822132023-10-30T22:33:29Z Effect of surface NH 3 anneal on the physical and electrical properties of HfO 2 films on Ge substrate Wu, N. Zhang, Q. Zhu, C. Yeo, C.C. Whang, S.J. Chan, D.S.H. Li, M.F. Cho, B.J. Chin, A. Kwong, D.-L. Du, A.Y. Tung, C.H. Balasubramanian, N. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.1737057 Applied Physics Letters 84 19 3741-3743 APPLA 2014-10-07T04:26:43Z 2014-10-07T04:26:43Z 2004-05-10 Article Wu, N., Zhang, Q., Zhu, C., Yeo, C.C., Whang, S.J., Chan, D.S.H., Li, M.F., Cho, B.J., Chin, A., Kwong, D.-L., Du, A.Y., Tung, C.H., Balasubramanian, N. (2004-05-10). Effect of surface NH 3 anneal on the physical and electrical properties of HfO 2 films on Ge substrate. Applied Physics Letters 84 (19) : 3741-3743. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1737057 00036951 http://scholarbank.nus.edu.sg/handle/10635/82213 000221210100007 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1063/1.1737057
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Wu, N. Zhang, Q. Zhu, C. Yeo, C.C. Whang, S.J. Chan, D.S.H. Li, M.F. Cho, B.J. Chin, A. Kwong, D.-L. Du, A.Y. Tung, C.H. Balasubramanian, N.
format	Article
author	Wu, N. Zhang, Q. Zhu, C. Yeo, C.C. Whang, S.J. Chan, D.S.H. Li, M.F. Cho, B.J. Chin, A. Kwong, D.-L. Du, A.Y. Tung, C.H. Balasubramanian, N.
spellingShingle	Wu, N. Zhang, Q. Zhu, C. Yeo, C.C. Whang, S.J. Chan, D.S.H. Li, M.F. Cho, B.J. Chin, A. Kwong, D.-L. Du, A.Y. Tung, C.H. Balasubramanian, N. Effect of surface NH 3 anneal on the physical and electrical properties of HfO 2 films on Ge substrate
author_sort	Wu, N.
title	Effect of surface NH 3 anneal on the physical and electrical properties of HfO 2 films on Ge substrate
title_short	Effect of surface NH 3 anneal on the physical and electrical properties of HfO 2 films on Ge substrate
title_full	Effect of surface NH 3 anneal on the physical and electrical properties of HfO 2 films on Ge substrate
title_fullStr	Effect of surface NH 3 anneal on the physical and electrical properties of HfO 2 films on Ge substrate
title_full_unstemmed	Effect of surface NH 3 anneal on the physical and electrical properties of HfO 2 films on Ge substrate
title_sort	effect of surface nh 3 anneal on the physical and electrical properties of hfo 2 films on ge substrate
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82213
_version_	1781784082385993728

Effect of surface NH 3 anneal on the physical and electrical properties of HfO 2 films on Ge substrate

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