Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film

Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film

10.1116/1.2141619

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Bibliographic Details
Main Authors: Chen, J., Yoo, W.J., Chan, D.S.H.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82231
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Institution: National University of Singapore
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Summary:10.1116/1.2141619

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