Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film
10.1116/1.2141619
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sg-nus-scholar.10635-822312023-10-26T09:08:12Z Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film Chen, J. Yoo, W.J. Chan, D.S.H. ELECTRICAL & COMPUTER ENGINEERING 10.1116/1.2141619 Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 24 1 133-140 JVTAD 2014-10-07T04:26:56Z 2014-10-07T04:26:56Z 2006-01 Article Chen, J., Yoo, W.J., Chan, D.S.H. (2006-01). Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 24 (1) : 133-140. ScholarBank@NUS Repository. https://doi.org/10.1116/1.2141619 07342101 http://scholarbank.nus.edu.sg/handle/10635/82231 000234814100020 Scopus |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Chen, J. Yoo, W.J. Chan, D.S.H. |
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Chen, J. Yoo, W.J. Chan, D.S.H. |
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Chen, J. Yoo, W.J. Chan, D.S.H. Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film |
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Chen, J. |
title |
Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film |
title_short |
Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film |
title_full |
Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film |
title_fullStr |
Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film |
title_full_unstemmed |
Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film |
title_sort |
effects of n2, o2, and ar plasma treatments on the removal of crystallized hfo2 film |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/82231 |
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