Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film

10.1116/1.2141619

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Main Authors: Chen, J., Yoo, W.J., Chan, D.S.H.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82231
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-822312023-10-26T09:08:12Z Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film Chen, J. Yoo, W.J. Chan, D.S.H. ELECTRICAL & COMPUTER ENGINEERING 10.1116/1.2141619 Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 24 1 133-140 JVTAD 2014-10-07T04:26:56Z 2014-10-07T04:26:56Z 2006-01 Article Chen, J., Yoo, W.J., Chan, D.S.H. (2006-01). Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 24 (1) : 133-140. ScholarBank@NUS Repository. https://doi.org/10.1116/1.2141619 07342101 http://scholarbank.nus.edu.sg/handle/10635/82231 000234814100020 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1116/1.2141619
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Chen, J.
Yoo, W.J.
Chan, D.S.H.
format Article
author Chen, J.
Yoo, W.J.
Chan, D.S.H.
spellingShingle Chen, J.
Yoo, W.J.
Chan, D.S.H.
Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film
author_sort Chen, J.
title Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film
title_short Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film
title_full Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film
title_fullStr Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film
title_full_unstemmed Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film
title_sort effects of n2, o2, and ar plasma treatments on the removal of crystallized hfo2 film
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82231
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