Fermi-Level Pinning Induced Thermal Instability in the Effective Work Function of TaN in TaN/SiO 2 Gate Stack

10.1109/LED.2004.824251

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Bibliographic Details
Main Authors:	Ren, C., Yu, H.Y., Kang, J.F., Hou, Y.T., Li, M.-F., Wang, W.D., Chan, D.S.H., Kwong, D.-L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Fermi-level pinning Metal gate TaN Work function
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82355
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-82355
record_format	dspace
spelling	sg-nus-scholar.10635-823552023-10-30T22:31:53Z Fermi-Level Pinning Induced Thermal Instability in the Effective Work Function of TaN in TaN/SiO 2 Gate Stack Ren, C. Yu, H.Y. Kang, J.F. Hou, Y.T. Li, M.-F. Wang, W.D. Chan, D.S.H. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING Fermi-level pinning Metal gate TaN Work function 10.1109/LED.2004.824251 IEEE Electron Device Letters 25 3 123-125 EDLED 2014-10-07T04:28:23Z 2014-10-07T04:28:23Z 2004-03 Article Ren, C., Yu, H.Y., Kang, J.F., Hou, Y.T., Li, M.-F., Wang, W.D., Chan, D.S.H., Kwong, D.-L. (2004-03). Fermi-Level Pinning Induced Thermal Instability in the Effective Work Function of TaN in TaN/SiO 2 Gate Stack. IEEE Electron Device Letters 25 (3) : 123-125. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2004.824251 07413106 http://scholarbank.nus.edu.sg/handle/10635/82355 000189389600003 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Fermi-level pinning Metal gate TaN Work function
spellingShingle	Fermi-level pinning Metal gate TaN Work function Ren, C. Yu, H.Y. Kang, J.F. Hou, Y.T. Li, M.-F. Wang, W.D. Chan, D.S.H. Kwong, D.-L. Fermi-Level Pinning Induced Thermal Instability in the Effective Work Function of TaN in TaN/SiO 2 Gate Stack
description	10.1109/LED.2004.824251
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Ren, C. Yu, H.Y. Kang, J.F. Hou, Y.T. Li, M.-F. Wang, W.D. Chan, D.S.H. Kwong, D.-L.
format	Article
author	Ren, C. Yu, H.Y. Kang, J.F. Hou, Y.T. Li, M.-F. Wang, W.D. Chan, D.S.H. Kwong, D.-L.
author_sort	Ren, C.
title	Fermi-Level Pinning Induced Thermal Instability in the Effective Work Function of TaN in TaN/SiO 2 Gate Stack
title_short	Fermi-Level Pinning Induced Thermal Instability in the Effective Work Function of TaN in TaN/SiO 2 Gate Stack
title_full	Fermi-Level Pinning Induced Thermal Instability in the Effective Work Function of TaN in TaN/SiO 2 Gate Stack
title_fullStr	Fermi-Level Pinning Induced Thermal Instability in the Effective Work Function of TaN in TaN/SiO 2 Gate Stack
title_full_unstemmed	Fermi-Level Pinning Induced Thermal Instability in the Effective Work Function of TaN in TaN/SiO 2 Gate Stack
title_sort	fermi-level pinning induced thermal instability in the effective work function of tan in tan/sio 2 gate stack
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82355
_version_	1781784117111685120

Fermi-Level Pinning Induced Thermal Instability in the Effective Work Function of TaN in TaN/SiO 2 Gate Stack

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