GaAs metal-oxide-semiconductor device with HfO2/TaN gate stack and thermal nitridation surface passivation
10.1063/1.2749840
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sg-nus-scholar.10635-823962023-10-27T08:28:37Z GaAs metal-oxide-semiconductor device with HfO2/TaN gate stack and thermal nitridation surface passivation Gao, F. Lee, S.J. Chi, D.Z. Balakumar, S. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.2749840 Applied Physics Letters 90 25 - APPLA 2014-10-07T04:28:52Z 2014-10-07T04:28:52Z 2007 Article Gao, F., Lee, S.J., Chi, D.Z., Balakumar, S., Kwong, D.-L. (2007). GaAs metal-oxide-semiconductor device with HfO2/TaN gate stack and thermal nitridation surface passivation. Applied Physics Letters 90 (25) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2749840 00036951 http://scholarbank.nus.edu.sg/handle/10635/82396 000247468900067 Scopus |
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10.1063/1.2749840 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Gao, F. Lee, S.J. Chi, D.Z. Balakumar, S. Kwong, D.-L. |
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Gao, F. Lee, S.J. Chi, D.Z. Balakumar, S. Kwong, D.-L. |
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Gao, F. Lee, S.J. Chi, D.Z. Balakumar, S. Kwong, D.-L. GaAs metal-oxide-semiconductor device with HfO2/TaN gate stack and thermal nitridation surface passivation |
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Gao, F. |
title |
GaAs metal-oxide-semiconductor device with HfO2/TaN gate stack and thermal nitridation surface passivation |
title_short |
GaAs metal-oxide-semiconductor device with HfO2/TaN gate stack and thermal nitridation surface passivation |
title_full |
GaAs metal-oxide-semiconductor device with HfO2/TaN gate stack and thermal nitridation surface passivation |
title_fullStr |
GaAs metal-oxide-semiconductor device with HfO2/TaN gate stack and thermal nitridation surface passivation |
title_full_unstemmed |
GaAs metal-oxide-semiconductor device with HfO2/TaN gate stack and thermal nitridation surface passivation |
title_sort |
gaas metal-oxide-semiconductor device with hfo2/tan gate stack and thermal nitridation surface passivation |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/82396 |
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