Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors

10.1063/1.3633104

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Main Authors: Liu, X., Kim Fong Low, E., Pan, J., Liu, W., Leong Teo, K., Tan, L.-S., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82496
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spelling sg-nus-scholar.10635-824962023-10-26T21:46:51Z Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors Liu, X. Kim Fong Low, E. Pan, J. Liu, W. Leong Teo, K. Tan, L.-S. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.3633104 Applied Physics Letters 99 9 - APPLA 2014-10-07T04:30:04Z 2014-10-07T04:30:04Z 2011-08-29 Article Liu, X., Kim Fong Low, E., Pan, J., Liu, W., Leong Teo, K., Tan, L.-S., Yeo, Y.-C. (2011-08-29). Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors. Applied Physics Letters 99 (9) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3633104 00036951 http://scholarbank.nus.edu.sg/handle/10635/82496 000294489300078 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1063/1.3633104
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Liu, X.
Kim Fong Low, E.
Pan, J.
Liu, W.
Leong Teo, K.
Tan, L.-S.
Yeo, Y.-C.
format Article
author Liu, X.
Kim Fong Low, E.
Pan, J.
Liu, W.
Leong Teo, K.
Tan, L.-S.
Yeo, Y.-C.
spellingShingle Liu, X.
Kim Fong Low, E.
Pan, J.
Liu, W.
Leong Teo, K.
Tan, L.-S.
Yeo, Y.-C.
Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors
author_sort Liu, X.
title Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors
title_short Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors
title_full Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors
title_fullStr Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors
title_full_unstemmed Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors
title_sort impact of in situ vacuum anneal and sih4 treatment on electrical characteristics of algan/gan metal-oxide-semiconductor high-electron mobility transistors
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82496
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