Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors
10.1063/1.3633104
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sg-nus-scholar.10635-824962023-10-26T21:46:51Z Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors Liu, X. Kim Fong Low, E. Pan, J. Liu, W. Leong Teo, K. Tan, L.-S. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.3633104 Applied Physics Letters 99 9 - APPLA 2014-10-07T04:30:04Z 2014-10-07T04:30:04Z 2011-08-29 Article Liu, X., Kim Fong Low, E., Pan, J., Liu, W., Leong Teo, K., Tan, L.-S., Yeo, Y.-C. (2011-08-29). Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors. Applied Physics Letters 99 (9) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3633104 00036951 http://scholarbank.nus.edu.sg/handle/10635/82496 000294489300078 Scopus |
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10.1063/1.3633104 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Liu, X. Kim Fong Low, E. Pan, J. Liu, W. Leong Teo, K. Tan, L.-S. Yeo, Y.-C. |
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Liu, X. Kim Fong Low, E. Pan, J. Liu, W. Leong Teo, K. Tan, L.-S. Yeo, Y.-C. |
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Liu, X. Kim Fong Low, E. Pan, J. Liu, W. Leong Teo, K. Tan, L.-S. Yeo, Y.-C. Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors |
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Liu, X. |
title |
Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors |
title_short |
Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors |
title_full |
Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors |
title_fullStr |
Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors |
title_full_unstemmed |
Impact of in situ vacuum anneal and SiH4 treatment on electrical characteristics of AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors |
title_sort |
impact of in situ vacuum anneal and sih4 treatment on electrical characteristics of algan/gan metal-oxide-semiconductor high-electron mobility transistors |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/82496 |
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