Interface engineering for InGaAs n-MOSFET application using plasma PH 3-N2 passivation

10.1149/1.3489946

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Main Authors: Oh, H.-J., Suleiman, S.A.B., Lee, S.
其他作者: ELECTRICAL & COMPUTER ENGINEERING
格式: Article
出版: 2014
在線閱讀:http://scholarbank.nus.edu.sg/handle/10635/82554
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spelling sg-nus-scholar.10635-825542024-11-10T21:13:30Z Interface engineering for InGaAs n-MOSFET application using plasma PH 3-N2 passivation Oh, H.-J. Suleiman, S.A.B. Lee, S. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.3489946 Journal of the Electrochemical Society 157 11 H1051-H1060 JESOA 2014-10-07T04:30:45Z 2014-10-07T04:30:45Z 2010 Article Oh, H.-J., Suleiman, S.A.B., Lee, S. (2010). Interface engineering for InGaAs n-MOSFET application using plasma PH 3-N2 passivation. Journal of the Electrochemical Society 157 (11) : H1051-H1060. ScholarBank@NUS Repository. https://doi.org/10.1149/1.3489946 00134651 http://scholarbank.nus.edu.sg/handle/10635/82554 000283857900092 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1149/1.3489946
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Oh, H.-J.
Suleiman, S.A.B.
Lee, S.
format Article
author Oh, H.-J.
Suleiman, S.A.B.
Lee, S.
spellingShingle Oh, H.-J.
Suleiman, S.A.B.
Lee, S.
Interface engineering for InGaAs n-MOSFET application using plasma PH 3-N2 passivation
author_sort Oh, H.-J.
title Interface engineering for InGaAs n-MOSFET application using plasma PH 3-N2 passivation
title_short Interface engineering for InGaAs n-MOSFET application using plasma PH 3-N2 passivation
title_full Interface engineering for InGaAs n-MOSFET application using plasma PH 3-N2 passivation
title_fullStr Interface engineering for InGaAs n-MOSFET application using plasma PH 3-N2 passivation
title_full_unstemmed Interface engineering for InGaAs n-MOSFET application using plasma PH 3-N2 passivation
title_sort interface engineering for ingaas n-mosfet application using plasma ph 3-n2 passivation
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82554
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