Interfacial and bulk properties of zirconium dioxide as a gate dielectric in metal-insulator-semiconductor structures and current transport mechanisms
10.1063/1.1561995
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sg-nus-scholar.10635-825602024-11-14T10:20:43Z Interfacial and bulk properties of zirconium dioxide as a gate dielectric in metal-insulator-semiconductor structures and current transport mechanisms Chim, W.K. Ng, T.H. Koh, B.H. Choi, W.K. Zheng, J.X. Tung, C.H. Du, A.Y. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.1561995 Journal of Applied Physics 93 8 4788-4793 JAPIA 2014-10-07T04:30:49Z 2014-10-07T04:30:49Z 2003-04-15 Article Chim, W.K., Ng, T.H., Koh, B.H., Choi, W.K., Zheng, J.X., Tung, C.H., Du, A.Y. (2003-04-15). Interfacial and bulk properties of zirconium dioxide as a gate dielectric in metal-insulator-semiconductor structures and current transport mechanisms. Journal of Applied Physics 93 (8) : 4788-4793. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1561995 00218979 http://scholarbank.nus.edu.sg/handle/10635/82560 000181863100065 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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| description |
10.1063/1.1561995 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Chim, W.K. Ng, T.H. Koh, B.H. Choi, W.K. Zheng, J.X. Tung, C.H. Du, A.Y. |
| format |
Article |
| author |
Chim, W.K. Ng, T.H. Koh, B.H. Choi, W.K. Zheng, J.X. Tung, C.H. Du, A.Y. |
| spellingShingle |
Chim, W.K. Ng, T.H. Koh, B.H. Choi, W.K. Zheng, J.X. Tung, C.H. Du, A.Y. Interfacial and bulk properties of zirconium dioxide as a gate dielectric in metal-insulator-semiconductor structures and current transport mechanisms |
| author_sort |
Chim, W.K. |
| title |
Interfacial and bulk properties of zirconium dioxide as a gate dielectric in metal-insulator-semiconductor structures and current transport mechanisms |
| title_short |
Interfacial and bulk properties of zirconium dioxide as a gate dielectric in metal-insulator-semiconductor structures and current transport mechanisms |
| title_full |
Interfacial and bulk properties of zirconium dioxide as a gate dielectric in metal-insulator-semiconductor structures and current transport mechanisms |
| title_fullStr |
Interfacial and bulk properties of zirconium dioxide as a gate dielectric in metal-insulator-semiconductor structures and current transport mechanisms |
| title_full_unstemmed |
Interfacial and bulk properties of zirconium dioxide as a gate dielectric in metal-insulator-semiconductor structures and current transport mechanisms |
| title_sort |
interfacial and bulk properties of zirconium dioxide as a gate dielectric in metal-insulator-semiconductor structures and current transport mechanisms |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/82560 |
| _version_ |
1821200788385431552 |