N2O oxidation of strained-Si/relaxed-SiGe heterostructure grown by UHVCVD

N2O oxidation of strained-Si/relaxed-SiGe heterostructure grown by UHVCVD

10.1016/S0038-1101(01)00238-6

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Bibliographic Details
Main Authors: Tan, C.S., Choi, W.K., Bera, L.K., Pey, K.L., Antoniadis, D.A., Fitzgerald, E.A., Currie, M.T., Maiti, C.K.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
N2O oxidation
Strained-Si/relaxed-SiGe heterostructure
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82738
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-827382023-10-30T08:02:21Z N2O oxidation of strained-Si/relaxed-SiGe heterostructure grown by UHVCVD Tan, C.S. Choi, W.K. Bera, L.K. Pey, K.L. Antoniadis, D.A. Fitzgerald, E.A. Currie, M.T. Maiti, C.K. ELECTRICAL & COMPUTER ENGINEERING N2O oxidation Strained-Si/relaxed-SiGe heterostructure 10.1016/S0038-1101(01)00238-6 Solid-State Electronics 45 11 1945-1949 SSELA 2014-10-07T04:32:55Z 2014-10-07T04:32:55Z 2001-11 Article Tan, C.S., Choi, W.K., Bera, L.K., Pey, K.L., Antoniadis, D.A., Fitzgerald, E.A., Currie, M.T., Maiti, C.K. (2001-11). N2O oxidation of strained-Si/relaxed-SiGe heterostructure grown by UHVCVD. Solid-State Electronics 45 (11) : 1945-1949. ScholarBank@NUS Repository. https://doi.org/10.1016/S0038-1101(01)00238-6 00381101 http://scholarbank.nus.edu.sg/handle/10635/82738 000172273900015 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic N2O oxidation
Strained-Si/relaxed-SiGe heterostructure
spellingShingle N2O oxidation
Strained-Si/relaxed-SiGe heterostructure
Tan, C.S.
Choi, W.K.
Bera, L.K.
Pey, K.L.
Antoniadis, D.A.
Fitzgerald, E.A.
Currie, M.T.
Maiti, C.K.
N2O oxidation of strained-Si/relaxed-SiGe heterostructure grown by UHVCVD
description 10.1016/S0038-1101(01)00238-6
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Tan, C.S.
Choi, W.K.
Bera, L.K.
Pey, K.L.
Antoniadis, D.A.
Fitzgerald, E.A.
Currie, M.T.
Maiti, C.K.
format Article
author Tan, C.S.
Choi, W.K.
Bera, L.K.
Pey, K.L.
Antoniadis, D.A.
Fitzgerald, E.A.
Currie, M.T.
Maiti, C.K.
author_sort Tan, C.S.
title N2O oxidation of strained-Si/relaxed-SiGe heterostructure grown by UHVCVD
title_short N2O oxidation of strained-Si/relaxed-SiGe heterostructure grown by UHVCVD
title_full N2O oxidation of strained-Si/relaxed-SiGe heterostructure grown by UHVCVD
title_fullStr N2O oxidation of strained-Si/relaxed-SiGe heterostructure grown by UHVCVD
title_full_unstemmed N2O oxidation of strained-Si/relaxed-SiGe heterostructure grown by UHVCVD
title_sort n2o oxidation of strained-si/relaxed-sige heterostructure grown by uhvcvd
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82738
_version_ 1781784211149029376

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