NiSi2 formation through annealing of nickel and dysprosium stack on Si(100) and impact on effective Schottky barrier height

10.1063/1.4772710

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Main Authors: Lim, P.S.Y., Chi, D.Z., Zhou, Q., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82764
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spelling sg-nus-scholar.10635-827642024-11-10T04:42:38Z NiSi2 formation through annealing of nickel and dysprosium stack on Si(100) and impact on effective Schottky barrier height Lim, P.S.Y. Chi, D.Z. Zhou, Q. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.4772710 Journal of Applied Physics 113 1 - JAPIA 2014-10-07T04:33:13Z 2014-10-07T04:33:13Z 2013-01-07 Article Lim, P.S.Y., Chi, D.Z., Zhou, Q., Yeo, Y.-C. (2013-01-07). NiSi2 formation through annealing of nickel and dysprosium stack on Si(100) and impact on effective Schottky barrier height. Journal of Applied Physics 113 (1) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.4772710 00218979 http://scholarbank.nus.edu.sg/handle/10635/82764 000313329000045 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1063/1.4772710
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Lim, P.S.Y.
Chi, D.Z.
Zhou, Q.
Yeo, Y.-C.
format Article
author Lim, P.S.Y.
Chi, D.Z.
Zhou, Q.
Yeo, Y.-C.
spellingShingle Lim, P.S.Y.
Chi, D.Z.
Zhou, Q.
Yeo, Y.-C.
NiSi2 formation through annealing of nickel and dysprosium stack on Si(100) and impact on effective Schottky barrier height
author_sort Lim, P.S.Y.
title NiSi2 formation through annealing of nickel and dysprosium stack on Si(100) and impact on effective Schottky barrier height
title_short NiSi2 formation through annealing of nickel and dysprosium stack on Si(100) and impact on effective Schottky barrier height
title_full NiSi2 formation through annealing of nickel and dysprosium stack on Si(100) and impact on effective Schottky barrier height
title_fullStr NiSi2 formation through annealing of nickel and dysprosium stack on Si(100) and impact on effective Schottky barrier height
title_full_unstemmed NiSi2 formation through annealing of nickel and dysprosium stack on Si(100) and impact on effective Schottky barrier height
title_sort nisi2 formation through annealing of nickel and dysprosium stack on si(100) and impact on effective schottky barrier height
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82764
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