Nonvolatile flash memory device using Ge nanocrystals embedded in HfAlO High-κ tunneling and control oxides: Device fabrication and electrical performance

10.1109/TED.2004.837011

Saved in:

Bibliographic Details
Main Authors:	Chen, J.H., Wang, Y.Q., Yoo, W.J., Yeo, Y.-C., Samudra, G., Chan, D.S.H., Du, A.Y., Kwong, D.-L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82777
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

id	sg-nus-scholar.10635-82777
record_format	dspace
spelling	sg-nus-scholar.10635-827772023-10-29T20:56:29Z Nonvolatile flash memory device using Ge nanocrystals embedded in HfAlO High-κ tunneling and control oxides: Device fabrication and electrical performance Chen, J.H. Wang, Y.Q. Yoo, W.J. Yeo, Y.-C. Samudra, G. Chan, D.S.H. Du, A.Y. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING 10.1109/TED.2004.837011 IEEE Transactions on Electron Devices 51 11 1840-1848 IETDA 2014-10-07T04:33:22Z 2014-10-07T04:33:22Z 2004-11 Article Chen, J.H., Wang, Y.Q., Yoo, W.J., Yeo, Y.-C., Samudra, G., Chan, D.S.H., Du, A.Y., Kwong, D.-L. (2004-11). Nonvolatile flash memory device using Ge nanocrystals embedded in HfAlO High-κ tunneling and control oxides: Device fabrication and electrical performance. IEEE Transactions on Electron Devices 51 (11) : 1840-1848. ScholarBank@NUS Repository. https://doi.org/10.1109/TED.2004.837011 00189383 http://scholarbank.nus.edu.sg/handle/10635/82777 000224656800013 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1109/TED.2004.837011
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Chen, J.H. Wang, Y.Q. Yoo, W.J. Yeo, Y.-C. Samudra, G. Chan, D.S.H. Du, A.Y. Kwong, D.-L.
format	Article
author	Chen, J.H. Wang, Y.Q. Yoo, W.J. Yeo, Y.-C. Samudra, G. Chan, D.S.H. Du, A.Y. Kwong, D.-L.
spellingShingle	Chen, J.H. Wang, Y.Q. Yoo, W.J. Yeo, Y.-C. Samudra, G. Chan, D.S.H. Du, A.Y. Kwong, D.-L. Nonvolatile flash memory device using Ge nanocrystals embedded in HfAlO High-κ tunneling and control oxides: Device fabrication and electrical performance
author_sort	Chen, J.H.
title	Nonvolatile flash memory device using Ge nanocrystals embedded in HfAlO High-κ tunneling and control oxides: Device fabrication and electrical performance
title_short	Nonvolatile flash memory device using Ge nanocrystals embedded in HfAlO High-κ tunneling and control oxides: Device fabrication and electrical performance
title_full	Nonvolatile flash memory device using Ge nanocrystals embedded in HfAlO High-κ tunneling and control oxides: Device fabrication and electrical performance
title_fullStr	Nonvolatile flash memory device using Ge nanocrystals embedded in HfAlO High-κ tunneling and control oxides: Device fabrication and electrical performance
title_full_unstemmed	Nonvolatile flash memory device using Ge nanocrystals embedded in HfAlO High-κ tunneling and control oxides: Device fabrication and electrical performance
title_sort	nonvolatile flash memory device using ge nanocrystals embedded in hfalo high-κ tunneling and control oxides: device fabrication and electrical performance
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82777
_version_	1781784220625010688

Nonvolatile flash memory device using Ge nanocrystals embedded in HfAlO High-κ tunneling and control oxides: Device fabrication and electrical performance

Similar Items