Nonvolatile flash memory device using Ge nanocrystals embedded in HfAlO High-κ tunneling and control oxides: Device fabrication and electrical performance

• Main Authors: Chen, J.H., Wang, Y.Q., Yoo, W.J., Yeo, Y.-C., Samudra, G., Chan, D.S.H., Du, A.Y., Kwong, D.-L.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/82777
• Institution: National University of Singapore

10.1109/TED.2004.837011