Physical and electrical characteristics of hafnium oxide films on AlGaN/GaN heterostructure grown by pulsed laser deposition

10.1016/j.tsf.2010.03.106

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Bibliographic Details
Main Authors: Tian, F., Chor, E.F.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82902
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Institution: National University of Singapore