Physical and electrical characterization of HfO2 metal-insulator-metal capacitors for Si analog circuit applications

10.1063/1.1579550

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Bibliographic Details
Main Authors:	Hu, H., Zhu, C., Lu, Y.F., Wu, Y.H., Liew, T., Li, M.F., Cho, B.J., Choi, W.K., Yakovlev, N.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82904
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-82904
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spelling	sg-nus-scholar.10635-829042023-10-27T08:56:49Z Physical and electrical characterization of HfO2 metal-insulator-metal capacitors for Si analog circuit applications Hu, H. Zhu, C. Lu, Y.F. Wu, Y.H. Liew, T. Li, M.F. Cho, B.J. Choi, W.K. Yakovlev, N. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.1579550 Journal of Applied Physics 94 1 551-557 JAPIA 2014-10-07T04:34:51Z 2014-10-07T04:34:51Z 2003-07-01 Article Hu, H., Zhu, C., Lu, Y.F., Wu, Y.H., Liew, T., Li, M.F., Cho, B.J., Choi, W.K., Yakovlev, N. (2003-07-01). Physical and electrical characterization of HfO2 metal-insulator-metal capacitors for Si analog circuit applications. Journal of Applied Physics 94 (1) : 551-557. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1579550 00218979 http://scholarbank.nus.edu.sg/handle/10635/82904 000183642900077 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1063/1.1579550
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Hu, H. Zhu, C. Lu, Y.F. Wu, Y.H. Liew, T. Li, M.F. Cho, B.J. Choi, W.K. Yakovlev, N.
format	Article
author	Hu, H. Zhu, C. Lu, Y.F. Wu, Y.H. Liew, T. Li, M.F. Cho, B.J. Choi, W.K. Yakovlev, N.
spellingShingle	Hu, H. Zhu, C. Lu, Y.F. Wu, Y.H. Liew, T. Li, M.F. Cho, B.J. Choi, W.K. Yakovlev, N. Physical and electrical characterization of HfO2 metal-insulator-metal capacitors for Si analog circuit applications
author_sort	Hu, H.
title	Physical and electrical characterization of HfO2 metal-insulator-metal capacitors for Si analog circuit applications
title_short	Physical and electrical characterization of HfO2 metal-insulator-metal capacitors for Si analog circuit applications
title_full	Physical and electrical characterization of HfO2 metal-insulator-metal capacitors for Si analog circuit applications
title_fullStr	Physical and electrical characterization of HfO2 metal-insulator-metal capacitors for Si analog circuit applications
title_full_unstemmed	Physical and electrical characterization of HfO2 metal-insulator-metal capacitors for Si analog circuit applications
title_sort	physical and electrical characterization of hfo2 metal-insulator-metal capacitors for si analog circuit applications
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82904
_version_	1781784249165152256

Physical and electrical characterization of HfO2 metal-insulator-metal capacitors for Si analog circuit applications

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