Strain engineering of ultra-thin silicon-on-insulator structures using through-buried-oxide ion implantation and crystallization

10.1016/j.sse.2013.01.027

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Bibliographic Details
Main Authors:	Ding, Y., Cheng, R., Zhou, Q., Du, A., Daval, N., Nguyen, B.-Y., Yeo, Y.-C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Ion implantation Nano-Beam Diffraction (NBD) SiGe SOI Strain Ultra-Thin Body and Buried-oxide (UTBB)
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83075
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-83075
record_format	dspace
spelling	sg-nus-scholar.10635-830752023-10-29T20:57:57Z Strain engineering of ultra-thin silicon-on-insulator structures using through-buried-oxide ion implantation and crystallization Ding, Y. Cheng, R. Zhou, Q. Du, A. Daval, N. Nguyen, B.-Y. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING Ion implantation Nano-Beam Diffraction (NBD) SiGe SOI Strain Ultra-Thin Body and Buried-oxide (UTBB) 10.1016/j.sse.2013.01.027 Solid-State Electronics 83 37-41 SSELA 2014-10-07T04:36:58Z 2014-10-07T04:36:58Z 2013 Article Ding, Y., Cheng, R., Zhou, Q., Du, A., Daval, N., Nguyen, B.-Y., Yeo, Y.-C. (2013). Strain engineering of ultra-thin silicon-on-insulator structures using through-buried-oxide ion implantation and crystallization. Solid-State Electronics 83 : 37-41. ScholarBank@NUS Repository. https://doi.org/10.1016/j.sse.2013.01.027 00381101 http://scholarbank.nus.edu.sg/handle/10635/83075 000318464500007 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Ion implantation Nano-Beam Diffraction (NBD) SiGe SOI Strain Ultra-Thin Body and Buried-oxide (UTBB)
spellingShingle	Ion implantation Nano-Beam Diffraction (NBD) SiGe SOI Strain Ultra-Thin Body and Buried-oxide (UTBB) Ding, Y. Cheng, R. Zhou, Q. Du, A. Daval, N. Nguyen, B.-Y. Yeo, Y.-C. Strain engineering of ultra-thin silicon-on-insulator structures using through-buried-oxide ion implantation and crystallization
description	10.1016/j.sse.2013.01.027
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Ding, Y. Cheng, R. Zhou, Q. Du, A. Daval, N. Nguyen, B.-Y. Yeo, Y.-C.
format	Article
author	Ding, Y. Cheng, R. Zhou, Q. Du, A. Daval, N. Nguyen, B.-Y. Yeo, Y.-C.
author_sort	Ding, Y.
title	Strain engineering of ultra-thin silicon-on-insulator structures using through-buried-oxide ion implantation and crystallization
title_short	Strain engineering of ultra-thin silicon-on-insulator structures using through-buried-oxide ion implantation and crystallization
title_full	Strain engineering of ultra-thin silicon-on-insulator structures using through-buried-oxide ion implantation and crystallization
title_fullStr	Strain engineering of ultra-thin silicon-on-insulator structures using through-buried-oxide ion implantation and crystallization
title_full_unstemmed	Strain engineering of ultra-thin silicon-on-insulator structures using through-buried-oxide ion implantation and crystallization
title_sort	strain engineering of ultra-thin silicon-on-insulator structures using through-buried-oxide ion implantation and crystallization
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83075
_version_	1781784293771575296

Strain engineering of ultra-thin silicon-on-insulator structures using through-buried-oxide ion implantation and crystallization

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