Thermal stability of (HfO2)x(Al2O 3)1-x on Si

10.1063/1.1519733

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Bibliographic Details
Main Authors: Yu, H.Y., Wu, N., Li, M.F., Zhu, C., Cho, B.J., Kwong, D.-L., Tung, C.H., Pan, J.S., Chai, J.W., Wang, W.D., Chi, D.Z., Ang, C.H., Zheng, J.Z., Ramanathan, S.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83192
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Institution: National University of Singapore
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Summary:10.1063/1.1519733